JX-9100 reverse osmosis equipment

JX-9100 reverse osmosis equipment

Industrial reverse osmosis equipment is mainly used as a pure water production device for industrial production water. Can be used for: water production in the optoelectronic industry, water production in the fine chemical industry, water production in the electroplating and coating industry, ultra pure water production in the electronic semiconductor industry, water production in the precision machinery industry, water production in the power plant boiler industry, replacing various distilled water and ultra pure water supply, etc. Production can be customized according to different needs. We can handle anything from 1T/H to 1000T/H.

Equipment Classification

According to the different process water requirements and raw water quality of various industries, different industrial reverse osmosis equipment can be customized to meet water standards.

Reverse osmosis equipment process

Industrial reverse osmosis equipment needs to be configured with different process flows according to actual water requirements, and the water standards for different industries are different. For example, the resistance is divided into 18M Ω. cm, 15M Ω. cm, 10M Ω. cm, 2M Ω. cm, 0.5M Ω. cm and other standards, and the conductivity ranges from 20uS/cm to 0.1uS/cm. Therefore, different pre-treatment systems, single-stage and two-stage reverse osmosis processes, and post-treatment systems (EDI electric desalination system, polishing mixed bed system, ultraviolet sterilization, ozone generator, chlorine dioxide, etc.) need to be configured according to different standards.

Application scenarios

1. Electronic industry water: semiconductor materials, devices, printed circuit boards, and integrated circuits; Ultra pure materials, ultra pure chemical reagents, and ultra pure chemical materials; LCD liquid crystal display screen, PDP plasma display screen; Production of high-quality cathode ray tubes and fluorescent powders; Production, processing, and cleaning of semiconductor materials and crystalline materials; Laboratories and pilot workshops; Optoelectronic products; Other high-tech precision products.

2. Water usage in the precision machinery industry: production and processing of automotive parts; Production and processing of aircraft and automobile engine blades; Production and processing of laser heads for printers and fax machines; Production and processing of read-write heads and disks for optical drives and hard drives; Production and processing of precision mechanical products with special requirements for other products.

3. Water used in the power plant boiler industry: meets the national or industry boiler feedwater standards (GB1576-79, DL/T561-95), and is suitable for the water quality requirements of medium and high pressure boiler makeup water. (Ultra) pure water with a resistivity of 0.5-10M Ω· cm.

4. Water used in the fine chemical industry: solvents and cleaning processes used in the production and processing of chemical materials; Chemical materials used in electronic semiconductors and integrated circuit boards; Production, processing, and purification of quartz and silicon materials; High purity ink, inkjet in fax printers, and nanoink.

5. Water for electroplating and coating industry: In the electroplating and coating industry, in order to increase the surface smoothness, brightness, and adhesion of the plated parts, pure water with a conductivity of 15uS/cm-5uS/cm or less is required for the preparation of the electroplating solution. In addition, pure water with a conductivity of 10uS/cm or less is also needed for cleaning the plated parts during rinsing. Ultrafiltration and reverse osmosis can also be used to recover precious metal ions from the rinsing solution, and the water that permeates through is returned for cleaning the plated parts.

Reverse osmosis membrane cleaning service

Although the reverse osmosis device adopts a reasonable pretreatment system and good operation management, it can only minimize the degree of fouling of the reverse osmosis membrane, and it is impossible to completely eliminate membrane fouling. Therefore, after a period of normal operation, the reverse osmosis device will be contaminated by various trace organic and inorganic substances. When the membrane is contaminated, obvious symptoms such as increased water production, desalination rate, and pressure drop at the inlet and outlet of the reverse osmosis device often occur. When the water production of the device decreases by 10% (at the same temperature and pressure), the excess salt permeability doubles, and the pressure drop doubles, and one of these three phenomena occurs, chemical cleaning is necessary. At the same time, when the reverse osmosis device needs to be shut down for a long time for protection, chemical cleaning is also required. It is worth noting that a decrease in inlet water temperature can also lead to a decrease in water production, which is normal and does not indicate membrane fouling. Malfunctions in pretreatment, high pressure, and other aspects can also cause a decrease in inlet water pressure, inlet water flow rate, water production flow rate, and desalination rate. When performing chemical cleaning, the first step is to determine the type of pollutant, and then select the appropriate cleaning formula and cleaning process based on the characteristics of the membrane. Attention should be paid to controlling the pH value, temperature, and inlet flow rate of the cleaning solution for each component. The cleaning effect can be confirmed by comparing the desalination rate, water production, and pressure drop of the device before and after cleaning. In addition to periodic chemical cleaning, after each shutdown, low-pressure and high flow flushing with pre treated water or reverse osmosis water is effective in reducing the rate of membrane fouling, extending the cycle of chemical cleaning, and prolonging the service life of the membrane.