JX-9200 Ultra Pure Water Equipment

JX-9200 Ultra Pure Water Equipment

Ultra pure water refers to water with extremely low impurity content, including inorganic ionized impurities such as: Ca、Mg、Na、K、Fe2+、Fe3+、Mn、Al、HCO、CO、SO、Cl、NO、NO、SiO、PO Wait; ② Organic compounds such as alkylbenzenesulfonic acid, oil, organic iron, organic aluminum, and other hydrocarbons; ③ Particles such as dust, iron oxide, aluminum, colloidal silicon, etc; ④ Microorganisms, such as bacteria, plankton, and algae; ⑤ Dissolve gases such as N2, O2, CO2, H2S, etc. The content of ionized impurities in ultrapure water is measured by the electrical resistivity value of water. In theory, only H ions and OH ions participate in conductivity in pure water. At 25 ℃, the electrical resistivity of ultrapure water is 18.3 (megaohms per centimeter), typically around 15-18 (megaohms per centimeter). Customized production can be carried out according to different needs, ranging from 1T/H to 1000T/H.

Equipment Classification

According to the different process water requirements and raw water quality of various industries, different ultra pure water reverse osmosis equipment can be customized to meet water standards.

Ultra pure water equipment process

Ultra pure water is a level that is difficult to achieve by general processes. It is processed through four steps: pretreatment, reverse osmosis technology, ultra purification treatment, and post-treatment. Multiple treatment methods are used, including multi-stage filtration, high-performance ion exchange units, ultrafiltration filters, ultraviolet lamps, TOC removal devices, EDI electric desalination devices, polishing mixed bed units, etc. The resistivity can reach 18.25M Ω* cm (25 ℃).

Application scenarios

1. Electronics, power, electroplating, lighting appliances, laboratories, food, papermaking, daily chemical products, building materials, paint making, batteries, laboratory testing, biology, pharmaceuticals, petroleum, chemical industry, steel, glass and other fields.

2. Pure water is used for chemical process water, chemical agents, cosmetics, etc.

3. Pure water is used for production processes such as monocrystalline silicon, semiconductor chip cutting and manufacturing, semiconductor chips, semiconductor packaging, lead cabinet frames, integrated circuits, liquid crystal displays, conductive glass, picture tubes, circuit boards, optical communication, computer components, capacitor cleaning products, and various electronic components.