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Maskless laser direct writing system

NegotiableUpdate on 02/01
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Overview
The PicoMaster ATE-100 uses a 405 nanometer wavelength diode laser with a 300 nanometer laser resolution, which can be upgraded to a 375 nanometer laser source to better accommodate I-line photoresist materials on the market and meet higher-level application requirements. The spare optical module of $r $n will revolutionize the reduction of machine downtime, and the more user-friendly software design greatly improves the actual operational efficiency of users. It will be your ideal optical partner for scientific research, experimental development, and design innovation.
Product Details

PicoMaster ATE-100 Maskless Laser Direct Writing Lithography Machine

250 nanometer resolution (375 nanometer laser source)

300 nanometer resolution (405 nanometer laser source)

4095 grayscale

● Complete set of holographic design software in the industry

Maximum 125x125mm substrate size

The PicoMaster 100 uses a 405 nanometer wavelength diode laser, which has the smallest 300 nanometer laser resolution on the market. Upgrading the 375 nanometer laser source can better accommodate I-line photoresist materials on the market, thereby meeting higher-level application requirements. Backup optical modules will greatly reduce machine downtime. A more user-friendly software design greatly improves the actual operational efficiency of users. It will be your ideal optical partner for scientific research, experimental development, and design innovation. PicoMaster 100 is widely used in various fields such as semiconductor lithography, LED chips, microfluidic chips, micro nano structures, grayscale lithography, 3D processing, holographic imaging, etc.

Performance specifications of PicoMaster 100 maskless laser direct writing system

无掩膜激光直写系统

«PicoMaster 100 Exposure LightOnly some representatives are listed in the scheduleExpressive writing accuracy does not representAll sizes;

«When PicoMaster 100 is exposedThe motion parameters in the table are allStandard setting;

«PicoMaster 100 can be equipped withAutomatic numerical aperture switch, allowingAllow users to choose lower resolutionRate, improve writing speed.


PicoMaster comes with two Windows based applications: Project Manager and Device Controller.When the device controller processes tasks and controls the machine, the project manager allows users to select functions and process images;The project manager has the characteristic of independently and dynamically processing images, which reduces the preparation time before the job;The device controller allows operators to queue project tasks, monitor project progress, and provide advanced manual control functions.

The characteristics of PicoMaster device controller:

Instant processing of homework.

Homework queue.

Freely definable processes and exposure formulas.

Expand the historical database.

Support remote operation.