Gas filter Entegris

NegotiableUpdate on 03/31

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Overview

WGFG01DSH is a point of use filter designed specifically for high-purity gas delivery systems. It is mainly used to protect downstream critical process equipment, remove particulate pollutants from gases, and ensure that process gases meet strict cleanliness requirements.

Product Details

Entegris WGFG01DSH gas filter

1. Product Overview
WGFG01DSH is a point of use filter designed specifically for high-purity gas delivery systems. It is mainly used to protect downstream critical process equipment, remove particulate pollutants from gases, and ensure that process gases meet strict cleanliness requirements.

2. Core parameters and specifications

project	Parameters/Specifications
Product Model	WGFG01DSH
Filter grade	Typically configured as 0.003 microns (3 nanometers) or higher grade metal sintered filter cartridges, depending on the ordering model suffix.
filter media	Stainless steel sintered metal fiber felt (such as Entegris' Bekaert fiber felt technology).
Shell material	316L stainless steel (low iron, low sulfur).
connection method	VCR ® Or VCO ® Face sealed joints, typically 1/4 inch or 1/2 inch in size (to be confirmed based on specific orders).
sealing material	Usually, all metal seals (without polymers) are used, or optional fluororubber that meets semiconductor process requirements (such as Viton) can be used ®/ FKM sealing ring.
design pressure	High pressure design, typical values such as 2000 PSI (138 bar) or higher, please refer to the product data sheet for details.
design temperature	Can adapt to high-temperature baking environments, with a typical working temperature range of over 150 ° C.
surface treatment	The interior of the shell is treated with electrolytic polishing (EP) to reduce particle adsorption and gas release rate.
Particle removal rate	For particles with a target particle size (such as ≥ 0.003 μ m), the removal efficiency is usually ≥ 99.9999%.
Factory testing	Each filter undergoes strict factory integrity testing (such as bubble point testing) and particle challenge testing, and provides a certification report (CoC).
Application field	Semiconductor manufacturing, display panels, photovoltaics, fiber preform and other processes that require ultra-high purity gases are commonly used in photolithography, etching CVD、 Gas supply lines for ion implantation and other equipment.

3. Main functional features
High capture efficiencyAdopting a deep loading mechanism, it has the ability to intercept submicron and nanometer sized particles.
Low precipitation and low gas releaseAll metal structure and electrolytic polishing treatment effectively control the precipitation of metal ions and reduce moisture and gas desorption.
High structural integrityDurable metal filter element and casing, capable of withstanding system pressure fluctuations, impacts, and high temperatures.
Wide compatibilitySuitable for various high-purity, corrosive, and inert process gases such as N ₂, H ₂, O ₂, Ar, He, SiH ₄, HCl, Cl ₂, WF ₆, etc.

4. Important note

The specific technical parameters (such as connection size, precise filtration level, pressure rating) should be based onThe final product specification sheet and certification report released by EntegrisTo be accurate.