High precision SEMIG5 level hydrogen fluoride online concentration detector

Product Introduction

In high-tech fields such as semiconductors and microelectronics, electronic grade hydrogen fluoride (HF) is used for its cleaning and etching functions.

In terms of ensuring product quality, concentration control is the foundation for ensuring cleaning and etching effects, avoiding excessive or insufficient, thereby ensuring product surface quality and performance.

In terms of stable production processes, fluctuations in HF concentration can lead to unstable processes, affecting production efficiency and yield. Stable concentration control is the key to achieving efficient production.

In terms of reducing production costs, by controlling the amount of HF used, reducing waste, lowering waste liquid treatment costs, and achieving economic benefits.

In terms of improving safety, mastering the concentration of HF can help assess potential safety risks and take corresponding protective measures to ensure the safety of operators.

In terms of meeting environmental requirements, controlling HF usage and reducing emissions can help companies meet increasingly strict environmental regulations.

Electronic grade hydrogen fluoride acid has a wide range of applications, including semiconductor manufacturing, and is used in key processes such as silicon wafer cleaning, oxide layer etching, and metal impurity removal; Microelectronics manufacturing, applied in integrated circuit manufacturing, liquid crystal display manufacturing, solar cell manufacturing and other processes; And laboratory research plays a role in chemical analysis, material research, and other fields.

However, traditional hydrogen fluoride concentration detection methods often rely on manual sampling and analysis, which has many drawbacks: time-consuming and labor-intensive, requiring manual sampling, testing, and waiting for analysis results, resulting in low efficiency; Lag, the analysis results cannot reflect the changes in HF concentration in real time, and the process cannot be adjusted in a timely manner; The error is relatively large, and manual operation can easily introduce errors, affecting the detection accuracy; More importantly, there are safety issues as direct contact with highly corrosive HF poses a high safety risk. Therefore, it is imperative to seek a more efficient and safe method for detecting hydrogen fluoride concentration.

Hydrogen fluoride acid online concentration detectorThe product hasHigh precision, SEMIG5 level, high temperature resistance, long-life light source, constant temperature detectorCharacteristics, measurement range 0-55%. The sensor adopts an ultra pure PTFE/PFA flow cell structure combined with a large-area sapphire optical prism. Through long-term technological accumulation and research and development, it has solved the bottleneck problem of online concentration measurement and control products for wet electronic chemicals in the semiconductor industry.

Product advantages

1. No pre-treatment of the sample, no need for reagents or consumables, the entire measurement process takes seconds.

2. A long-lasting light source that lasts up to 100000 hours, reducing usage and maintenance costs.

3. Some materials are not affected by color or turbidity.

4. Some materials are not affected by bubbles or particles.

5. Some materials are not affected by pressure changes, sudden changes in flow rate, or turbulence phenomena of the tested object.

6. The instrument has no mechanical action during the detection process, ensuring long-term stable use.

7. Detect the full planar structure of the prism to avoid dirt and grime accumulation in the optical window.

8. Factory calibration and automatic temperature compensation, directly put into use.

9. Support upper computer communication, 4-20mA&RS485 signal output.

10. Support the output of switch signals such as alarm and control.

11. Support data modeling function and customizable data models.

Technical Specifications