Hydrogen fluoride concentration analyzer online automatic detection, durable and maintenance free

Product Introduction

Hydrogen fluoride concentration analyzerThe product has the characteristics of high precision, SEMIG5 level, high temperature resistance, long-life light source, constant temperature detector, etc., with a measurement range of 0-55%. The sensor adopts an ultra pure PTFE/PFA flow cell structure combined with a large-area sapphire optical prism. Through long-term technological accumulation and research and development, it has solved the bottleneck problem of online concentration measurement and control products for wet electronic chemicals in the semiconductor industry.

Hydrogen fluoride concentration analyzerNo need for sample pretreatment, no need for reagents or consumables, fast measurement in seconds, allowing enterprises to grasp production dynamics in real time. There is no mechanical action during the testing process to ensure long-term stability. The instrument adopts an ultra long lifespan light source that can last up to 100000 hours, with no mechanical action during the detection process, ensuring long-term stable operation and reducing maintenance costs. The detection prism with a fully planar structure avoids the accumulation of dirt and grime. Factory calibration and automatic temperature compensation allow you to put it into use directly without complicated settings. Supports upper computer communication, 4-20mA&RS485 signal output, alarm and control switch signal output, supports data modeling function, and can customize data models.

Application field

The hydrogen fluoride concentration analyzer is mainly used in fields that require monitoring and control of hydrogen fluoride concentration, including:

1. Semiconductor manufacturing:

• Etching process: In the semiconductor manufacturing process, hydrogen fluoride acid is widely used as an etchant to remove materials such as silicon oxide and silicon nitride. Controlling the concentration of hydrogen fluoride acid is crucial for controlling the etching rate and ensuring etching uniformity.

• Cleaning process: Hydrofluoric acid is also used to clean impurities and residues on the surface of wafers. Concentration control also affects cleaning effectiveness and wafer quality.

• Doping process: In some doping processes, hydrogen fluoride acid is used to pretreat the wafer surface.

2. Manufacturing of solar cells:

• Silicon wafer surface treatment: Hydrogen fluoride acid is used to clean the surface of silicon wafers, remove surface oxide layers and metal impurities, and improve the photoelectric conversion efficiency of solar cells.

• Suede treatment: Some solar cell production processes use hydrogen fluoride acid to roughen the surface of silicon wafers, increasing their light absorption rate.

3. LCD and OLED manufacturing:

• Glass substrate cleaning: In the manufacturing process of LCD and OLED, hydrogen fluoride acid is used to clean the glass substrate, remove surface pollutants, and improve display quality.

• Thin film etching: Some thin film processes use hydrogen fluoride acid for selective etching.

4. Chemical Analysis Laboratory:

• High purity reagent preparation: used to prepare high-purity hydrogen fluoride acid solutions as important reagents in analytical chemistry experiments.

• Sample pretreatment: Hydrofluoric acid is used to dissolve some insoluble samples for subsequent chemical analysis.

5. Production of electronic chemicals:

• Quality control: In the production process of electronic grade hydrogen fluoride acid, real-time monitoring of product concentration is required to ensure that the product meets quality standards.

• Process optimization: By measuring concentration data, optimize production processes to improve product purity and yield.

6. Research institution:

• Materials research: used to study the corrosion behavior of hydrogen fluoride acids on various materials, providing reference for the development of new materials.

• Chemical reaction research: used to study various chemical reactions involving hydrogen fluoride acids, such as fluorination reactions.

Technical Specifications