Plasma Vacuum Evaporation System Vacuum Plasma Coating Machine

NegotiableUpdate on 05/16

Model

Nature of the Manufacturer: Producers

Product Category

Place of Origin

Online Consult

Overview

The plasma vacuum evaporation system uses a high-frequency and high-voltage power supply to generate plasma in a certain vacuum environment or specific gas atmosphere By high-energy ion impact on the surface of materials, pollutants and impurities are removed, resulting in surface roughness and increased surface area. Thereby changing the chemical properties of the material surface, improving its hydrophilicity, adhesion, wear resistance and other properties. After vapor deposition of thickening agents (or coupling agents, anti sticking agents) on the surface of substrates (such as silicon wafers, gallium arsenide, lithium niobate, glass, sapphire, wafers, etc.), they can react to generate compounds mainly composed of siloxane upon heating. It successfully transformed the substrate surface

Product Details

Plasma Vacuum Evaporation System Vacuum Plasma Coating Machine

Generate plasma in a certain vacuum environment or specific gas atmosphere using a high-frequency and high-voltage power supply By high-energy ion impact on the surface of materials, pollutants and impurities are removed, resulting in surface roughness and increased surface area. Thereby changing the chemical properties of the material surface, improving its hydrophilicity, adhesion, wear resistance and other properties. After vapor deposition of thickening agents (or coupling agents, anti sticking agents) on the surface of substrates (such as silicon wafers, gallium arsenide, lithium niobate, glass, sapphire, wafers, etc.), they can react to generate compounds mainly composed of siloxane upon heating. It successfully transforms the substrate surface from hydrophilic to hydrophobic, and its hydrophobic groups can bond well with the photoresist, acting as coupling agents.

Function of vacuum plasma coating machine in plasma vacuum evaporation system

Frequency of power system occurrence: 13.56M

Power type: RF power supply, adjustable power (including automatic matching device)

Number of electrode plate layers: 2 layers (or multiple layers)

Electrode plate arrangement: horizontal arrangement/vertical arrangement

Distance between electrode plates: 150mm (can be specified)

Material of the cavity: The inner box is made of 316L stainless steel

Temperature range: Room temperature -150 ℃

Vacuum degree: ≤ 30pa

Vacuum pump: oil-free vacuum pump

Coupling agent: 1-2 routes of coupling agent can be selected for liquid inlet system

Gas path: 1-5 options available

Cleaning function: adjustable plasma cleaning time, frequency, power supply, etc

Coating system: Coating time, number of cycles, and coating process can be edited

Operating Interface: Human Computer Interface/Industrial Control Computer

Automation function: optional MES, GEM and other intelligent systems can be connected online

Plasma cleaning machines are used to clean optical components, electronic components, laser devices, coated substrates, chips, and improve the adhesion of adhesives used to bond optical components, optical fibers, biomedical materials, aerospace materials, etc. They remove oxides from the surface of metal materials, activate the surface of glass, plastic, ceramic, high polymer and other materials, enhance their surface adhesion, wettability, compatibility, and surface modification of polymer materials.