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E-mail
zhixuling789@126.com
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Phone
18810401088
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Address
Fengtai District
Product Categories
- Imported electron beam exposure system
- Inductively coupled plasma etching
- Reactive ion etching
- RAITH Maskless Laser Direct Writing Equipment
- High resolution deep ultraviolet lithography machine
- French JFP wire bonding machine
- Desktop electron microscope
- Laser direct writing equipment
- nanoindenter
- EKC270
- Chemical vapor deposition
Beijing Zhongke Fuhua Technology Co., Ltd
DMD laser direct writing lithography machine
NegotiableUpdate on 02/01
- Model
- Nature of the Manufacturer
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Overview
Desktop miniaturization $r $n $r $n maskless lithography machine is a type of lithography technology equipment that does not require the use of traditional physical masks to transfer circuit patterns. Instead, it uses computer-controlled high-precision beams to directly scan and expose photosensitive materials, forming the required fine patterns. Currently in microelectronics manufacturing, micro nano processing MEMS、LED、 Biochips and other fields have wide applications.
Product Details
ZML10A is an innovative desktop level maskless lithography equipment designed specifically for efficient and precise micro nano processing requirements. This device uses high-power and high uniformity LED light sources, combined with DLP technology, to achieve yellow or green light guided exposure function, truly achieving "what you see is what you get", greatly improving operational convenience and process controllability. Its optical path structure and high-precision linear motor displacement stage ensure exposure accuracy and repeatability, while equipped with a CCD camera field by field autofocus system, further optimizing imaging quality and process stability. The device supports electric objective lens switching and laser active focusing function, which can flexibly meet the needs of different application scenarios. Its compact desktop miniaturization design not only saves space, but also facilitates deployment in laboratories or production environments. In addition, the ZML10A is equipped with an intuitive and easy-to-use software interface, greatly reducing the operating threshold, allowing even beginners to quickly get started. Whether it is the preparation of complex micro nano structures such as metamaterial structures, electrode patterns, or microfluidic chips, ZML10A can provide reliable support and is an ideal choice for researchers and industrial users.
• Technical Features
▲ Desktop miniaturization
▲ High power, high uniformity LED engraving light source
▲ Yellow/green light guided exposure, what you see is what you get
▲ CCD camera automatically focuses on each image field by field
▲ High precision linear motor displacement table
▲ Easy to operate software interface
• The optical path is far away from the structural diagram
• Key Metrics
| Key technical indicators | ||
| Center wavelength of ultraviolet light source | 405nm | |
| Exposure uniformity | 90% | |
| Minimum feature line width | 0.5um | |
| Single field exposure area | 0.6*0.4mm（@0.5um） | |
| Writing speed | 3mm^2/min(@0.5um) | |
| configuration | Basic Edition | Professional Edition |
| light source | Strong LED: 405nm | |
| DMD chip | DLP6500 | |
| Single exposure area | 0.6*0.4mm（@0.5um）、1.2*0.8mm（@0.8um） 2.4*1.6mm（@1.5um）、12*8mm（@8um） |
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| camera | Large target surface microscope camera (supporting size measurement) | |
| Engraving accuracy | 1um | 0.7um |
| Engraving speed | 3mm²/min(@0.5um) | 20mm²/min(@0.5um) |
| Sports platform | High precision linear motor (repeated positioning accuracy ± 0.5um) leveling mechanism, manual rotating table | High precision linear motor (repeated positioning accuracy ± 0.5um) leveling mechanism, electric rotary table |
| Objective lens converter | Manual objective lens switching | Electric objective lens switching |
| Focusing module group | CCD image autofocus | Laser active focusing |
| Support silicon wafer size | 4inch | 8inch |
Application Cases
