SENTECH RIE plasma etching machine from Germany

Low cost efficiencyYigao

RIE plasma etching machine Etchlab 200 combined with parallel plate plasma source design and direct wafer placement.

Upgrade scalability

According to its modular design, the plasma etching machine Etchlab 200 can be upgraded to a larger vacuum pump unit, pre vacuum chamber, and more gas paths.

SENTECH control software

This plasma etching machine is equipped with user-friendly and powerful software, featuring a simulated graphical user interface, parameter window, and process capabilitiesEditing windows, data recording, and user management.

Etchlab 200RIE plasma etching machineRepresenting the direct placement plasma etching machine family, it combines the advantages of RIE's parallel plate electrode design and the cost-effectiveness design of direct placement. The characteristic of Etchlab 200 is simple and fast sample loading, directly loading from parts to 200mm or 300mm diameter chips onto electrodes or carriers. Flexibility, modularity, and small footprint are the design features of Etchlab 200. The diagnostic window located at the top electrode and reaction chamber can conveniently accommodate SENTECH laser interferometers or OES and RGA systems. The ellipsometer port can be used for in-situ monitoring with SENTECH in-situ ellipsometer.

The Etchlab 200 plasma etching machine can be configured for etching directly loaded materials, including but not limited to silicon and silicon compounds, compound semiconductors, dielectrics, and metals.

Etchlab 200Operated through SENTECH control software, utilizing remote fieldbus technology and a user-friendly universal user interface.

Etchlab 200：

• RIE plasma etching machine

• Open lid design

• Suitable for 200mm chips

• Diagnostic window for laser interferometers and OES

• Optional ellipsometer interface

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Etchlab 200 with pre vacuum chamber:

• RIE etching machine with pre vacuum chamber

• Suitable for chips ranging from 4 inches to 8 inches

• Small piece or fragment carrier

• Chlorine based etching gas

• Larger vacuum pump assembly

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Etchlab 200-300：

• RIE plasma etching machine

• Open lid design

• Suitable for 300mm chips

• Diagnostic window for laser interferometers and OES

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