DuPont etching solution

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Features:

Establish the integrity of the metal stack for Zui Jia

Improve the wide window processing capability

Strengthen the removal of etching residues

The cleaned mask reduces chemical residues

Ultra Large Scale Integrated Circuit (ULSI) level specification * for package cleaning

Low evaporation rate at working temperature

Application:

Application EKC270 ™ Etched residue collectors are widely used in the semiconductor industry to meet critical cleaning needs

From high aspect ratio MEMS devices to 100μm+Various stages of 70nm integration into DRAM

The following are common applications:

• Contact cleaning

• Metal wire cleaning

• TSV deep silicon perforation cleaning

• Tungsten buried line cleaning

• Polyimide cleaning

• Pad cleaning

• MEMS cleaning